Gallium oxide single crystal substrate and epitaxial wafer
We can provide gallium oxide single crystal substrate and epitaxial wafer
Single crystal substrate:
Size: 4inch, 2inch, 10*10mm, 10*15mm
Doping: undoped, Sn doped, Fe doped
Crystal plane: 100 010 001
Thickness: uniformly 650um+-20um
10-10 15-15 Monocrystalline Gallium Oxide Substrate.pdf
2-inch Monocrystalline Gallium Oxide Substrate.pdf
4-inch Monocrystalline Gallium Oxide Substrate.pdf
Epitaxial wafer:
Al2o3-based epitaxial wafer
Principle:
The basic principle of preparing gallium oxide single crystal substrate mainly includes the following aspects:
1. Epitaxial growth: Through epitaxial growth technology, gallium oxide epitaxial wafer is deposited on gallium oxide single crystal substrate. The commonly used technologies include chemical vapor deposition (CVD) or molecular beam epitaxy (MBE).
2. Lattice matching: The epitaxially grown gallium oxide epitaxial wafer needs to have good lattice matching with the substrate to ensure high-quality epitaxial wafer growth.
3. Doping control: According to the specific application needs, the gallium oxide epitaxial wafer is properly doped to adjust its optical and electrical properties.
Types:
The types of gallium oxide single crystal substrates mainly include:
1. Undoped gallium oxide substrate: pure gallium oxide material substrate, usually used to prepare high-quality gallium oxide epitaxial wafers.
2. Doped gallium oxide substrate: by adding specific impurity elements such as rare earth elements or transition metals into gallium oxide to adjust its optical, electrical or magnetic properties.
Application fields:
Gallium oxide single crystal substrates have a wide range of applications in the following fields:
1. Optical devices: such as lasers, LEDs (light emitting diodes), LDs (laser diodes), etc.
2. Optoelectronic devices: such as photovoltaic devices, photodetectors, etc.
3. Sensors: such as optical sensors, chemical sensors, etc.
Gallium oxide single crystal substrates play an important role in the preparation of optoelectronic devices due to their good optical properties, thermal properties and chemical stability. Its application range covers a wide range of fields from optical communications to photoelectric energy conversion.
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.
