1. Contact lithography machine (MA6, EVG)
Sample size: 1cm*1cm small piece, 2 inches, 4 inches, 6 inches, 8 inches
Minimum line width spacing 2um overlay accuracy ±1um
2. Stepper lithography machine
Stepper i7/i10/i12, DUV lithography machine
Sample size: 4 inches, 6 inches
Minimum line width spacing 130nm overlay accuracy ≤0.15um, can be used for mass production of chips
3. Electron beam lithography
Sample size: 15mm*15mm, 20mm*20mm, 38*38mm, 2inch, 3inch, 4inch
Minimum line width spacing 10nm overlay accuracy 40nm
4. Back overlay
Minimum line width spacing 2um overlay accuracy ±2um
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.
