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Etching

1 Deep silicon etching (DRIE)


Maximum aspect ratio 50:1


Sample size: small piece, 4 inches, 6 inches, 8 inches


2 Reactive ion etching (RIE)


Etching materials: Si, SiN, SiO2


Sample size: small piece, 4 inches, 6 inches, 8 inches


3 Ion beam etching (IBE)


Etching materials: Au, Ti, Cr, Ni, VO2, Al2O3, W, Al, and other metals, oxides, nitrides


Sample size: small piece, 4 inches, 6 inches, 8 inches


4 Silicon oxide, SiC etching


Etching materials: quartz, glass, SiC, etc.


Sample size: small piece, 4 inches, 6 inches


5 Metal dry etcher


Etching of metals and metal compounds such as Ti, TiN, Al, Al2O3, Ta, TaN, Mo, Ge


Sample size: small piece, 4 inches, 6 inches


6 ICP etching


Etching materials: GAN, GaAs, AlGaInP, etc.


7 Wet etching


Acidic: H2SO4, HF, BOE, Cr etching solution


Alkaline: KOH, TMAH


8. Deep silicon etching


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About Us

OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.

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