1 Deep silicon etching (DRIE)
Maximum aspect ratio 50:1
Sample size: small piece, 4 inches, 6 inches, 8 inches
2 Reactive ion etching (RIE)
Etching materials: Si, SiN, SiO2
Sample size: small piece, 4 inches, 6 inches, 8 inches
3 Ion beam etching (IBE)
Etching materials: Au, Ti, Cr, Ni, VO2, Al2O3, W, Al, and other metals, oxides, nitrides
Sample size: small piece, 4 inches, 6 inches, 8 inches
4 Silicon oxide, SiC etching
Etching materials: quartz, glass, SiC, etc.
Sample size: small piece, 4 inches, 6 inches
5 Metal dry etcher
Etching of metals and metal compounds such as Ti, TiN, Al, Al2O3, Ta, TaN, Mo, Ge
Sample size: small piece, 4 inches, 6 inches
6 ICP etching
Etching materials: GAN, GaAs, AlGaInP, etc.
7 Wet etching
Acidic: H2SO4, HF, BOE, Cr etching solution
Alkaline: KOH, TMAH
8. Deep silicon etching
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.