Capabilities:
Fabrication process: Laser direct writing/electron beam lithography
Cr material:
Material: Quartz glass/soda glass
Regular size: 3006, 4009, 5009, 6012, 6025, 7012, 9012, 12"x12", 14"x14"
Thickness: 1.5+0.2mm, 2.3+0.2mm, 3.0+0.2mm, 4.8±0.2mm, 6.35±0.2mm
Cr film type: low reflectivity chrome film
Optical Density (λ=450nm): Between Plates3.0 + 0.3 In Plate ± 0.3
Reflectivity (In=436nm): Between Plates10 ± 5% In Plate ± 2%
Accuracy:
Item/Class | A | B | C | D | E | F | G | H/I |
Min.Line/Space Width on Wafer | ＞1.0um | 1.0um | 0.8um | 0.5um | 0.35um | 0.2um | 0.18um | 0.15/0.13um |
CD Control | ±0.3um | ±0.25um | ±0.2um | ±0.15um | ±0.1um | ±0.07um | ±0.05um | ±0.025um |
CD Uniformity | 0.4um | 0.3um | 0.25um | 0.2um | 0.12um | 0.1um | 0.07um | 0.03um |
Registration Accuracy | ±0.3um | ±0.25um | ±0.2um | ±0.15um | ±0.12um | ±0.1um | ±0.07um | ±0.035um |
Overlay Accuracy | ±0.3um | ±0.25um | ±0.2um | ±0.15um | ±0.1um | ±0.08um | ±0.06um | ±0.035um |
Defect Size | ＜1.5um | ＜1.0um | ＜1.0um | ＜0.8um | ＜0.75um | ＜0.5um | ＜0.35um | ＜0.3um |
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.
