LNOI Fabrication Capbility
SIZE:6inch
Min CD SIZE:180nm
Etching Depth and Uniformity:300nm+-10nm/600nm
LN Etching Sidewall Tilt Angle:70°
High-Speed Cu Electrode:Ti/Cu, 3 dB bandwidth >50 GHz
*6 inches 24 shots fabrication:
*LN etching side wall tilt angle 70°
*High-speed Cu electrode
*LN MOD bandwidth > 60 GHz
*Grating coupler loss 8 dB
Cross waveguide loss 0.02 dB/piece
Directional Coupler:
*All-pass micro-ring Q value 1e6
1×2MMI insertion loss <0.2 dB
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.
+86 188 233 40140
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+86 188 233 40140
