I am glad that you can see our coating promotion page. Scroll down to learn more about our processing capabilities. On this page, we will give you a comprehensive introduction to our coating capabilities. As you know, and you are also confused, in our usual research, the demand for coating is diverse.
A variety of coating materials may be used,
Oxides (hafnium oxide, titanium oxide, silicon oxide, zirconium oxide, tantalum oxide, gallium oxide...), nitrides (titanium nitride, silicon nitride, tantalum nitride, gallium nitride...), compounds (gallium arsenide), metals (gold, silver, copper, iron, aluminum, chromium, titanium, nickel),
You will also encounter a variety of coating process requirements
(evaporation coating process, magnetron sputtering coating process, ion beam sputtering coating process, atomic layer evaporation coating process, pulsed laser deposition coating process, low-pressure chemical vapor deposition process, plasma enhanced chemical vapor deposition process),
The substrate may also be of multiple sizes
For example, small pieces, 4 inches, 6 inches, 8 inches, 12 inches.
At the same time, sometimes the film you need is not just a simple single-layer film, but a multi-layer film, a superposition of multiple processes. Therefore, at this time, we have comprehensive coating capabilities and are very important. We provide multi-material, multi-process, and multi-size composite coating processes for your thin film deposition needs, comprehensively solving your cost, precision, and supply problems. At the same time, we support bringing your own target materials to help your scientific research.
Click on our photos below to learn about the unique process capabilities of each of our processes
| Material | EBE | magnetron Sputtering | IBS | PECVD | ICPCVD | LPCVD | ALD | PLD | MOCVD | MBE |
| Au | O | O | ||||||||
| Ag | O | O | ||||||||
| Ta | O | |||||||||
| Al | O | O | ||||||||
| Cu | O | |||||||||
| Fe | O | |||||||||
| Mo | O | |||||||||
| Ti | O | O | ||||||||
| Ni | O | O | ||||||||
| W | O | |||||||||
| Ge | O | |||||||||
| Ir | O | |||||||||
| Zr | O | |||||||||
| Pt | O | O | ||||||||
| Cr | O | O | ||||||||
| NiCr | O | |||||||||
| TiW | O | |||||||||
| WC | O | |||||||||
| C | O | |||||||||
| NiSn | O | |||||||||
| AgSn | O | |||||||||
| AuSn | O | O | ||||||||
| MoS2 | O | |||||||||
| Ta2O5 | O | O | ||||||||
| TiO2 | O | O | O | |||||||
| GaO | O | |||||||||
| Ga2O3 | O | |||||||||
| Al2O3 | O | O | ||||||||
| IZO | O | |||||||||
| IGZO | O | |||||||||
| ITO | O | |||||||||
| CeO | O | |||||||||
| HfO2 | O | O | ||||||||
| NiO | O | |||||||||
| ZrO2 | O | O | O | |||||||
| Y2O3 | O | |||||||||
| WO3 | O | |||||||||
| MgO | O | O | O | |||||||
| GaN | O | |||||||||
| AlScN | O | |||||||||
| AlN | O | |||||||||
| TiN | O | |||||||||
| SiNX | O | O | ||||||||
| Si3N4 | O | O | O | |||||||
| SiC | O | |||||||||
| SiON | O | |||||||||
| Poly Si | O | |||||||||
| α Si | O | O | O | |||||||
| TEOS Sio2 | O | O | ||||||||
| SrTiO3 | O | |||||||||
| BaTiO3 | O | |||||||||
| MgF2 | O |
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.
