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ion implantation

OMedasemi provide ion implantation service ,our advantage is high efficient fabrication, i have listed the fabrication capbility ,please check our capbility and tell us which kind of ion implantation process you need .


Business Process:

For customers requiring ion implantation processing, please provide the following information (fill in what you know):

  • Sample size (up to 12 inches):

  • Sample thickness (up to 1.3 mm):

  • Sample material:

  • Implantation angle (usually 7 degrees or 0 degrees):

  • Elements to be implanted:

  • Implantation energy:

  • Implantation dose:

  • Annealing : For annealing, we offer three types of processes (RTA rapid thermal annealing, LPCVD furnace annealing, and FLA flash annealing), if you want to know more about our Annealing capbility ,please click this link :Annealing Capbility

  • Surface Resistivity (RS) Measurement:if you need please tell us .


Regarding the relationship between implantation energy, dose, implantation depth, and angle, please refer to this article: The relationship between implantation energy, dose, depth, and angle in the ion implantation process.

Summary of Implantation Capabilities:

  • Gas State Ion Implantation:

    • Gaseous Implantation: B, P, F,  N, Ar, H, As, O, He,C

    • Implantation energy range: 10 KeV - 900 KeV

    • Implantation dose range: e11 - e15

  • Solid-State Implantation: Ni(Nickel), Al-Aluminum, Cu-Copper, Fe-Iron, Zr-Zirconium, Zn-Zinc, Mn-Manganese, Ti-Titanium, Cr--Chromium, Ag-Silver, Mg-Magnesium, Sn-Tin, Pb-Lead,Si-Silicon

    • Implantation energy range: <= 50 KeV

    • Implantation dose range: e15 - e19

  • MeV Implantation Equipment:

    • Maximum energy: 2 MeV, maximum dose depends on implantation time

    • Substrate can be heated up to 500°C

    • Process maturity: High

    • Maximum size: 6 mm x 6 mm

    • Cycle time: 7 days (domestic processing)

We can provide MeV-level ion beams for elements such as Fe, Ni, Cu, V, Ti, Mo, Zr, Mg, Al, Si, Au, Ag, N, O, Er, etc., with temperatures ranging from room temperature to 800°C.


Application:

SIlicon carbide color center 

Silicon color center 

Diamond color center 

electric device




About Us

OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.

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