Two-photon polymerization glue
Shanghai Omedasemi provides photoresist glue for two-photon 3D printing. This glue is completely developed by our team .these photoresist/glue are tested in most two photon 3d printing machine and show excellent performance.
also we provide two photon 3d printing service :Two photon Polymerization 3D printing Service
Compared with competitor glue, this glue has the following advantages:
*Higher activity
*Not sensitive to UV rays, no need to store at low temperature away from light. Two-photon polymerization activity is higher, and the printing speed can reach 100mm/s at 15mw laser power
*Compatible with 515nm-800nm femtosecond laser
*Cost effective, minimum order of 1 tube of 5g.
Developing process: Soak in propylene glycol monomethyl ether acetate for 10 minutes, twice, then soak in isopropyl alcohol for 5 minutes, and finally air dry naturally.
If the printed structure has a depth-to-diameter ratio greater than 10, or the pore structure is smaller than 10 microns, the soaking time in propylene glycol monomethyl ether acetate can be extended, depending on the actual situation.
If propylene glycol monomethyl ether acetate is not available, ethyl acetate, isopropyl alcohol, or ethanol can be used as substitutes, but the soaking time needs to be extended.
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.
