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Grating and metasurface processing-Nanofabrication and profile tailoring of high index Ta2O5 optical gratings for LiDAR using C4F8/SF6 plasma mixtures

Date: 2025-03-04 11:23:03     Hits: 13

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Nanofabrication and Profile Tailoring of High-Index Ta2O5 Optical Gratings for LiDAR Using C4F8SF6 Plasma Mixtures.pdf

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The paper focuses on the fabrication and profile tailoring of high-refractive-index Ta2O5 optical gratings for LiDAR systems, using C4F8/SF6 plasma mixtures. The research investigates how to control the etching process and the resulting grating profiles to achieve high diffraction efficiency (DE), which is crucial for improving LiDAR performance. By adjusting process parameters like power, pressure, and gas ratios during inductively coupled plasma etching, the study optimizes the grating's sidewall angle and duty cycle, leading to efficient diffraction characteristics. The Ta2O5 gratings achieve over 85% DE for both transverse electric (TE) and transverse magnetic (TM) polarizations at 808 nm, making them highly suitable for medium-range LiDAR systems. This work presents a scalable and flexible method for fabricating diffractive optics, applicable to other fields such as augmented and virtual reality, where high-efficiency optical components are essential.




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