This study investigates the integration of Erbium (Er³⁺) ions into X-cut thin-film lithium niobate (TFLN) using focused ion beam (FIB) implantation to enable applications in quantum photonics and telecom-based devices. The research explores how deterministic doping with Er³⁺ ions in TFLN can enhance the material’s performance in areas such as quantum memory, amplification, and single-photon emission in the telecom band.
Ion Implantation Process:
The study uses FIB implantation for precise, sub-100 nm spatial control of Er³⁺ ions in the TFLN material. The implantation doses range from 10¹³ to 10¹⁵ ions/cm², allowing for controlled doping with minimal damage to the material's surface, which is crucial for integrated nanophotonics.
The ion implantation was modeled and analyzed using SRIM simulations, which showed a peak depth of approximately 25 nm for the Er⁺ ions.
Photoluminescence (PL) Characteristics:
PL spectra were measured for samples implanted with varying Er³⁺ doses. At low temperatures (around 50 K), the spectra showed Stark-split transitions similar to bulk Er-doped lithium niobate, confirming that the ions were occupying lattice sites comparable to those in bulk Er-doped materials.
The intensity of the PL response was found to be proportional to the implantation dose, with higher doses leading to stronger emission. The study also noted that no detrimental ion-ion interactions occurred at the highest doses tested.
Low-Temperature Behavior:
The PL intensity and decay times were studied as a function of temperature. As the temperature decreased, the PL intensity increased, stabilizing below 100 K, then rapidly decreased below 50 K.
This decrease in PL intensity and lifetime at lower temperatures is linked to the pyroelectric effect in LiNbO₃. At low temperatures, the pyroelectric response in lithium niobate leads to changes in the local electric field, which in turn affects the emission characteristics of Er³⁺.
Polarization Dependence:
Polarized PL spectra revealed that the emission transitions were primarily σ-polarized, with certain transitions (e.g., Y1 → Z5) showing a distinct π-polarized characteristic. This supports the hypothesis that pyroelectric effects affect the luminescence more significantly for certain polarized states.
Physical Mechanism of Low-Temperature Effects:
The observed low-temperature anomalies in emission intensity and lifetime are speculated to be caused by changes in the ferroelectric polarization of LiNbO₃. These changes lead to electric fields that influence the luminescence of Er³⁺ ions.
The behavior is consistent with known pyroelectric effects in lithium niobate, where the spontaneous polarization decreases with temperature, leading to a dramatic decrease in the pyroelectric response at low temperatures, affecting the optical properties.
Conclusion:
The study demonstrates that FIB implantation is an effective method for integrating Er³⁺ ions into TFLN, achieving high precision and compatibility with integrated photonic devices.
The results offer important insights into the low-temperature behavior of Er³⁺-doped TFLN and highlight the influence of pyroelectric effects on quantum emitters in LiNbO₃ at cryogenic temperatures.
The findings contribute to the development of quantum memory, single-photon sources, and other quantum photonic applications, providing a path for the deterministic integration of rare-earth ions in integrated photonic circuits.
This work paves the way for utilizing Er³⁺ ions in TFLN for scalable, multifunctional photonic circuits in both quantum and classical applications.
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.