Nanofabrication and Composite Wafers--OMedaSemi

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NanoFabrication

Photolithography

Laser direct writing lithography

Electron Beam Lithography

6/8 inch DUV Stepper lithography

Contact lithography

Etching

RIE

IBE

XXXX

ICP Etching

DRIE

FIB

Coating

E-Beam Evaporation

Magnetron Sputtering

Ion-Beam Sputtering

Atomic layer Deposition

Pulsed Laser Deposition

Optical Coating

LPCVD

PECVD

Bonding

Anodic bonding

Temporary Bonding and Debonding

Wire Bonding

Eutectic bonding

Surface Actived Bonding

Fusion Bonding

Hydrophilic Bonding

cutting

Gringding&CMP

ion implantation

Furnace annealing and rapid annealing

Nanoimprint printing

**Two photon Polymerization 3D printing Service
Innovative Products and Service

**Photonics Wire Bonding

**Grating and Metasurface

Flexible electrode

Silicon optical waveguide

Silicon nitride optical waveguide

Lithium niobate waveguide processing

Microfluidic chip

Suspended beam chip

Mask template processing

Forked electrode

Deep silicon etching

Two photon Polymerization Lithography Resist Glue
Wafer Series

GaAs Wafer

InP wafer

Glass Wafer &High Refraction Index Wafer

Silicon Wafer wafer&Thermally oxidized Si wafer

Wafer with Diverse Material Coating

N Type & 4H Semi Insulating SiC Wafer

Gallium Nitride and GaN Epitaxial Wafer

Ga2O3 Wafer

Diamond Wafer

Customized SOI Wafer

InPOI Wafer

Ultra low loss Si3N4 ThinFilm wafer(SINOI)

POI (Piezoelectric on Insulator)Wafer

LTOI Wafer

LNOI Wafer

4H HPSI SICOI Wafer

X on X Composite substrate**
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NanoFabrication

Professional and efficient micro nano processing product services

Photolithography

Etching

Coating

Bonding

cutting

Gringding&CMP

ion implantation

Furnace annealing and rapid annealing

Nanoimprint printing

**Two photon Polymerization 3D printing Service

Innovative Products and Service

Professional and efficient processing of characteristic projects

**Photonics Wire Bonding

**Grating and Metasurface

Flexible electrode

Silicon optical waveguide

Silicon nitride optical waveguide

Lithium niobate waveguide processing

Microfluidic chip

Suspended beam chip

Mask template processing

Forked electrode

Deep silicon etching

Two photon Polymerization Lithography Resist Glue

Wafer Series

Professional and efficient wafer product services

Customized SOI Wafer

GaAs Wafer

N Type & 4H Semi Insulating SiC Wafer

InPOI Wafer

InP wafer

Gallium Nitride and GaN Epitaxial Wafer

Glass Wafer &High Refraction Index Wafer

Ga2O3 Wafer

Ultra low loss Si3N4 ThinFilm wafer(SINOI)

POI (Piezoelectric on Insulator)Wafer

Silicon Wafer wafer&Thermally oxidized Si wafer

Diamond Wafer

Wafer with Diverse Material Coating

LTOI Wafer

LNOI Wafer

4H HPSI SICOI Wafer

X on X Composite substrate**

News center

Use PECVD Method Deposite Silicon Nitride on Three different kinds of Wafer

PECVD Si3N4 (SIlicon Nitride) on Glass(BF33 JGS1 Quartz Fused Silica)

InP and Silicon bonded Wafer --Room-Temperature Bonding of Indium Phosphide Wafers and Their Atomic Structure at the Bond Interface

Glass and Glass bonding service --Room Temperature Wafer Bonding of Glass Using Aluminum Oxide Intermediate Layer

Two photon Polymerization 3D printing Service--Two-photon lithography for integrated photonic packaging

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About Us

OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.

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