Near stoichiometric lithium niobate (NSLN) wafers
Tangential | X-Z ;Z-X | |||
Diameter | 76.2±0.2mm | 100.0±0.2mm | 150.0±0.2mm | |
PF length | 22±2mm | 32±2mm | 47.5±2mm | |
SF length | Depending on customer requirements | |||
Thicknesses | 180~250±20μm, 350±20μm, 500±20μm | |||
WARP | <25μm | |||
BOW | -25μm<BOW<25μm | |||
TTV | <5μm | |||
PLTV(LTV<1μm) | >95%(5mm*5mm) | |||
Positive Roughness (Ra) | <1nm | |||
Backside Roughness (Ra) | <1nm | |||
ApplicationAreas | Photonics Integrated Circuit |
Near stoichiometric ratio lithium niobate (NSLN) wafer optical fundamental performance index:
Performance | Congruent LiNbO3 (CLT) | Near Stoichiometric ratio LiNbO3 (NSLN) |
Curietemperature(℃) | 1142 | 701 |
Li/Ta | 48.5/51.5 | 49.9/50.1 |
Linearelectro-opticalcoefficient @λ=632.8nm(pm/V) | r13=10 r33=32.5 | r13=10.4 r33=38.4 |
Nonlinearopticalcoefficient @λ=1064nm(pm/V) | d13= 6.1 d33=34.1 | d13= 6.3 d33=44.3 |
Coercivefield(roomtemperature) KV/mm | ~21 | <4 |
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.