Today i will share the refractive index and absorption data of Photonics and NanoOptics
we list most material for you to use ,if you have the thin film that you are interested in that we do not list ,we will try to deposite and test it
Substrate:
Substrate N&K of JGS1 Fused SIlica
Substrate N&K of Silicon Carbide
Substrate N&K of Lithium Niobate
Substrate N&K of Lithium Tantalate
Thin FIlm For PIC
SiO2 N&K of Thermal Oxide Wafer fabricated By wet Oxidation
Sio2 N and K Value of 4.7um thermal Oxide wafer.docx
Silicon on insulator fabricated By SmartCut Process
N and K Value of Silicon of SOI wafer.xls
Silicon Nitride on insulator fabricated By LPCVD+Annealing Process
N and K Value of Silicon Nitride of SiNOI wafer.xlsx
Lithium Niobate on insulator fabricated By SmartCut Process
Congrudent LNOI N&K Value Of Bulk Crystal and Thin Film.zip
Lithium Tantalate on insulator fabricated By SmartCut Process
Congrudent LTOI N&K Value Of Bulk Crystal and Thin Film.zip
Silicon Carbide on insulator fabricated By Grinding and CMP Process
Thin film and Bulk Silicon Carbide.zip
PLZT on insulator fabricated By SOLGEL
BTO on insulator fabricated By SOLGEL
BTO N&K by Sol-Gel Poly crytsal.xlsx
Thin Film For Nano Optic
Film By EBE
SiO2 on Silicon Fabricated By EBE
TiO2 on Fused Silica JGS1 Fabricated By EBE
Ta2O5 on Fused Silica JGS1 Fabricated By EBE
Refractive Index of Ta2O5.xlsx
Ta2O5 on Fused Silica JGS1 Fabricated By IBS
AL2O3 on Fused Silica JGS1 Fabricated By EBE
Refractive Index of AL2O3.xlsx
Amorphous Silicon on Fused Silica JGS1 Fabricated By EBE
Refractive Index of Amorphous SIlicon.xlsx
Silicon Oxide on Glass By Pecvd:
PECVD SiO2-200nm on BF33 Schott.docx
Amorphous Silicon on Fused Silica JGS1 Fabricated By PECVD
PECVD a-Si 300nm on Fused Silica JGS1.docx
PECVD a-Si 400nm on Fused Silica JGS1.docx
PECVD 460nm a-Si on Fused Silica JGS1.docx
Silicon Nitride on Fused Silica JGS1 Fabricated By PECVD
PECVD-SiN-100nm ON 500um 8inch BF33.docx
PECVD-SiN-500nm ON 500um 8inch BF33.docx
PECVD-SiN-50nm ON 500um 8inch BF33.docx
PECVD-SiN-20nm ON 500um 8inch BF33.docx
PECVD-SiN-500nm on Fused Silica.docx
PECVD SiN 1000nm on Fused Silica JGS1.docx
Other Thin Film
800nm 23%AlScN on Silicon by PVD.docx
OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.