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Refractive Index and Absorption Data For Nano Optics and PIC

Date: 2026-02-05 18:20:46     Hits: 1513

Today i will share the refractive index and absorption data of Photonics and NanoOptics

we list most material for you to use ,if you have the thin film that you are interested in that we do not list ,we will try to deposite and test it 


Substrate:

Substrate N&K of JGS1 Fused SIlica

 JGS1-N(1)(2).xlsx

Substrate N&K of Silicon Carbide

Bulk SIC crystal nk.xlsx

Substrate N&K of Lithium Niobate

Bulk Crystal LN nk.txt

Substrate N&K of Lithium Tantalate

Bulk crystal LT nk.xlsx


Thin FIlm For PIC

SiO2 N&K of Thermal Oxide Wafer fabricated By wet Oxidation

Sio2 N and K Value of  4.7um  thermal Oxide wafer.docx

Silicon on insulator   fabricated By SmartCut Process

N and K Value of Silicon of SOI wafer.xls

Silicon Nitride on insulator   fabricated By LPCVD+Annealing Process

 N and K Value of Silicon Nitride of SiNOI wafer.xlsx

Lithium Niobate on insulator fabricated By SmartCut Process

 Congrudent LNOI N&K Value Of  Bulk Crystal and Thin Film.zip

Lithium Tantalate  on insulator fabricated By SmartCut Process

Congrudent LTOI N&K Value Of  Bulk Crystal and Thin Film.zip

Silicon Carbide on insulator fabricated By Grinding and CMP Process

Thin film and Bulk Silicon Carbide.zip

PLZT on insulator  fabricated By SOLGEL

PLZT N&K by sol gel.xlsx

BTO on insulator  fabricated By SOLGEL

 BTO N&K by Sol-Gel Poly crytsal.xlsx


Thin Film For Nano Optic

Film By EBE

SiO2 on Silicon Fabricated By EBE

Refractive Index of SiO2.xlsx

TiO2 on Fused Silica JGS1 Fabricated By EBE

Refractive Index of TiO2.xlsx

Ta2O5 on Fused Silica JGS1 Fabricated By EBE

Refractive Index of Ta2O5.xlsx

Ta2O5 on Fused Silica JGS1 Fabricated By IBS

Ta2O5 on SiO2 by IBS.txt

AL2O3 on Fused Silica JGS1 Fabricated By EBE

Refractive Index of AL2O3.xlsx

Amorphous Silicon on Fused Silica JGS1 Fabricated By EBE

Refractive Index of Amorphous SIlicon.xlsx

Silicon Oxide on Glass By Pecvd:

 PECVD SiO2-200nm on BF33 Schott.docx

Amorphous Silicon on Fused Silica JGS1 Fabricated By PECVD

 PECVD a-Si 300nm on Fused Silica JGS1.docx

 PECVD a-Si 400nm on Fused Silica JGS1.docx

 PECVD 460nm a-Si on Fused Silica JGS1.docx

Silicon Nitride on Fused Silica JGS1 Fabricated By PECVD

 PECVD-SiN-100nm ON 500um 8inch BF33.docx

 PECVD-SiN-500nm ON 500um 8inch BF33.docx

 PECVD-SiN-50nm ON 500um 8inch BF33.docx

 PECVD-SiN-20nm ON 500um 8inch BF33.docx

 PECVD-SiN-500nm on Fused Silica.docx

 PECVD SiN 1000nm on Fused Silica JGS1.docx


Other Thin Film

800nm 23%AlScN on Silicon by PVD.docx





About Us

OMeda (Shanghai Omedasemi Co.,Ltd) was founded in 2021 by 3 doctors with more than 10 years of experience in nanpfabrication. It currently has 15 employees and has rich experience in nanofabrication (coating, lithography, etching, two-photon printing, bonding) and other processes. We support nanofabrication of 4/6/8-inch wafers.

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